{"id":3912,"date":"2024-07-16T15:45:46","date_gmt":"2024-07-16T13:45:46","guid":{"rendered":"https:\/\/lafer.eu\/trattamento-hipims-il-futuro-della-tecnologia-pvd\/"},"modified":"2025-08-07T14:36:39","modified_gmt":"2025-08-07T12:36:39","slug":"hipims-the-future-of-pvd-technology","status":"publish","type":"post","link":"https:\/\/lafer.eu\/en\/hipims-the-future-of-pvd-technology\/","title":{"rendered":"HiPIMS: The Future of PVD Technology"},"content":{"rendered":"

Index<\/strong><\/p>\n<\/div>

    \n
  1. Characteristics of HiPIMS Treatment<\/li>\n
  2. Advantages: Why Choose HiPIMS Technology?\n
      \n
    1. Fields of Application<\/li>\n
    2. Sustainability<\/li>\n<\/ol>\n<\/li>\n<\/ol>\n<\/div><\/div><\/div><\/div><\/div>
      <\/div>

      1. Characteristics of HiPIMS Treatment<\/strong><\/h2><\/div>

      Like the DC Magnetron Sputtering process, HiPIMS technology allows for the deposition of coatings with extremely low surface roughness, free from droplets, and with reduced internal stress.<\/strong><\/p>\n

      Tests demonstrate excellent coating adhesion, which is directly related to the high level of ionization during deposition. HiPIMS coatings are both hard and durable due to the dense and nearly amorphous structure of the film. A consistent and homogeneous coating thickness distribution around three-dimensional objects, such as the cutting edge of a tool, ensures excellent wear resistance.<\/p>\n

      This technology allows for a deposition rate that can reach up to 2 \u03bcm\/h.<\/p>\n<\/div><\/div><\/div>

      \"Spessore<\/div><\/div><\/div><\/div>
      <\/div>

      2. Advantages: Why Choose HiPIMS Technology?<\/strong><\/h2><\/div>